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Membrane/Filter BUSINESS
Filter Biz
From material to system
Membrane water treatment using membrane technology
Membrane water treatment using membrane technology
The filter is a porous filtering medium that removes pollutants from liquid or gas. Synopex provides a comprehensive solution related to the filtration system by vertically integrating filters related to Micro-Filtration.
We developed and are supplying various filters for water treatment, including high-flow and high-performance filters for semiconductor and LCD production lines. We are leading the localization of high-performance filter products with high dependence on imports by securing the core technology of the advanced water treatment industry that leads the new growth engine industry. Synopex, which develops and supplies high-performance filters using nanotechnology, have developed and supplied water treatment filters for major semiconductor and LCD production lines locally and abroad.
We developed and are supplying various filters for water treatment, including high-flow and high-performance filters for semiconductor and LCD production lines. We are leading the localization of high-performance filter products with high dependence on imports by securing the core technology of the advanced water treatment industry that leads the new growth engine industry. Synopex, which develops and supplies high-performance filters using nanotechnology, have developed and supplied water treatment filters for major semiconductor and LCD production lines locally and abroad.
CMP
Description
Synopex CMP Cartridge Filter is a filter product that has been developed for the CMP (Chemical Mechanical Polishing) process in the semiconductor manufacturing process, and is designed to remove large particles that can cause defects (scratches) on the wafer surface while passing through working slurry particles.
In particular, it is designed to improve the life of the filter by reducing premature clogging of the filter by enabling stepwise particle removal with the multi-layer gradient structure.
Main features
- Expanded slurry life and constant supply of slurry
- Only large particles causing damage to the wafer surface can be removed
- High flow rate possible with large filter surface area
- Gradient Structure
- Quality Certificate / Validation Guide provided
Applications
- ILD Polishing slurries (Fumed silica)
- STI Polishing Sluuies ( Ceria)
Do you have any inquiries?
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- 54-42, Dongtanhana 1-gil, Hwaseong-si, Gyeonggi-do
- TEL : 031-379-7777
- Fax : 031-377-8057
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